Inductively coupled Cl2/Ar plasma: Experimental investigation and modeling

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 21, Issue 4, 2003, Pages 1568-1573

  Efremov, A M ^a,b   Kim, Dong Pyo ^a   Kim, Chang Il ^a  

^a Chung Ang University   (South Korea)

^b IVANOVO STATE UNIVERSITY OF CHEMISTRY AND TECHNOLOGY   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

ADDITION REACTIONS; ARGON; ATOMS; CHLORINE; DEFORMATION; DISSOCIATION; ELECTRONS; INDUCTIVELY COUPLED PLASMA; IONIZATION; KINETIC THEORY; MATHEMATICAL MODELS; MOLECULES;

ACTIVE PARTICLES; CHLORINE ATOMS; ELECTRON ENERGY DISTRIBUTION; ELECTRON IMPACT IONIZATION; PLASMA MODELING; PLASMA VOLUME; TRANSPARENCY EFFECT; VOLUME DENSITIES;

SEMICONDUCTOR PLASMAS;

EID: 0042530362     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1564030     Document Type: Article

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