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Volumn 81, Issue 5, 1997, Pages 2410-2417

Luminescence from plasma deposited silicon films

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0000542830     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.364247     Document Type: Article
Times cited : (106)

References (62)
  • 11
    • 0004764508 scopus 로고
    • Plasma Processing of Materials: Scientific opportunities and Technological Challenges
    • National Academy Press, Washington DC
    • J. Proud, R. A. Gottscho, and panel on Plasma Processing of Materials, Plasma Processing of Materials: Scientific opportunities and Technological Challenges, National Research Council Report (National Academy Press, Washington DC, 1991).
    • (1991) National Research Council Report
    • Proud, J.1    Gottscho, R.A.2
  • 14
    • 0013155671 scopus 로고
    • Microcrystalline Semiconductors; Materials Science and Devices
    • MRS, Pittsburgh
    • See, for example, Microcrystalline Semiconductors; Materials Science and Devices edited by P. M. Fauchet, C. C. Tsai, L. T. Canham, I. Shimizu, and Y. Aoyagi, Mater. Res. Symp. Proc. 283 (MRS, Pittsburgh, 1993).
    • (1993) Mater. Res. Symp. Proc. , vol.283
    • Fauchet, P.M.1    Tsai, C.C.2    Canham, L.T.3    Shimizu, I.4    Aoyagi, Y.5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.