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Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 6, 1998, Pages 3929-3933

Nanolithography using wet etched silicon nitride phase masks

(3) Alkaisi, M M a Blaikie, R J a McNab, S J a

a UNIVERSITY OF CANTERBURY (New Zealand)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000227891 PISSN: 10711023 EISSN: None Source Type: Journal
DOI: 10.1116/1.590439 Document Type: Article

Times cited : (11)

References (14)

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