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Volumn 182, Issue 3, 2006, Pages 319-324

Rapid prototyping of silica glass microstructures by the LIBWE method: Fabrication of deep microtrenches

Author keywords

Microtrench; Nanosecond pulsed UV laser; Rapid prototyping; Silica glass; Surface microstructuring

Indexed keywords


EID: 33747337810     PISSN: 10106030     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jphotochem.2006.05.033     Document Type: Article
Times cited : (31)

References (42)
  • 37
    • 33747369528 scopus 로고    scopus 로고
    • Y. Kawaguchi, H. Niino, T. Sato, A. Narazaki, R. Kurosaki, J. Phys. Conf. Ser., submitted for publication.
  • 38
    • 33747375570 scopus 로고    scopus 로고
    • H. Niino, Y. Kawaguchi. T. Sato, A. Narazaki, T. Gumpenberger, R. Kurosaki, J. Phys. Conf. Ser., submitted for publication.
  • 41
    • 33747354285 scopus 로고    scopus 로고
    • -2 is half fluence of what we used for microtrench etching using the LIBWE method.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.