Micron- and submicron-sized surface patterning of silica glass by LIBWE method

Journal of Photochemistry and Photobiology A: Chemistry

Volumn 166, Issue 1-3, 2004, Pages 129-133

  Ding, Ximing ^a   Kawaguchi, Yoshizo ^a   Sato, Tadatake ^a   Narazaki, Aiko ^a   Kurosaki, Ryozo ^a   Niino, Hiroyuki ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Ablation; Micro bubble; Nanosecond pulsed UV laser; Shockwave; Silica glass; Surface micro structuring; Time resolved shadowgraph microscopy

Indexed keywords

GLASS; SILICON DIOXIDE; TOLUENE;

ARTICLE; CHEMICAL PROCEDURES; CHEMICAL STRUCTURE; CONTROLLED STUDY; EXCIMER LASER; GRATING; IRRADIATION; MICROSCOPY; NANOPARTICLE; SHOCK WAVE; STRUCTURE ANALYSIS; SURFACE PROPERTY;

EID: 3543104863     PISSN: 10106030     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jphotochem.2004.04.040     Document Type: Article

References (26)

1. D. Bäuerle, Laser Proces. Chem., third edition, Springer, Berlin, Heidelberg, 2000.
2. Ihlemann J. Wolff B. Simon P. Appl. Phys. A54 1992 363
3. Herman P.R. Marjoribanks R.S. Oettl A. Chen K. Konovalov I. Ness S. Appl. Surf. Sci. 154-155 2000 577
4. Sugioka K. Wada S. Tashiro H. Toyoda K. Nakamura A. Appl. Phys. Lett. 65 1994 1510
5. Zhang J. Sugioka K. Midorikawa K. Opt. Lett. 23 1998 1486
6. Zhang J. Sugioka K. Midorikawa K. Appl. Phys. A67 1998 499
7. Varel H. Ashkenasi D. Rosenfeld A. Wähmer M. Campbell E.E.B. Appl. Phys. A65 1997 367
8. Wang J. Niino H. Yabe A. Appl. Phys. A68 1999 111
9. Wang J. Niino H. Yabe A. Appl. Phys. A69 1999 S271
10. Wang J. Niino H. Yabe A. Jpn. J. Appl. Phys. 38 1999 L761
11. Wang J. Niino H. Yabe A. Appl. Surf. Sci. 154-155 2000 571
12. Yasui Y. Niino H. Kawaguchi Y. Yabe A. Appl. Surf. Sci. 186 2002 552
13. Ding X. Yasui Y. Niino H. Kawaguchi Y. Yabe A. Appl. Phys. A75 2002 437
14. Ding X. Kawaguchi Y. Niino H. Yabe A. Appl. Phys. A75 2002 641
15. Niino H. Yasui Y. Ding X. Narazaki A. Sato T. Kawaguchi Y. Yabe A. J. Photochem. Photobiol. A: Chem. 158 2003 179
16. Ding X. Sato T. Kawaguchi Y. Niino H. Jpn. J. Appl. Phys. 42 2003 L176
17. X. Ding, Y. Kawaguchi, T. Sato, A. Narazaki, H. Niino, Chem. Commun. 2003 2168
18. Y. Kawaguchi, X. Ding, A. Narazaki, T. Sato, H. Niino, Appl. Phys. A, in press
19. Böhme R. Braun A. Zimmer K. Appl. Surf. Sci. 186 2002 276
20. Zimmer K. Böhme R. Braun A. Rauschenbach B. Bigl F. Appl. Phys. A74 2002 453
21. Zimmer K. Braun A. Böhme R. Appl. Surf. Sci. 208-209 2003 199
22. Böhme R. Spemann D. Zimmer K. Thin Solid Films 453-454 2004 127
23. Kopitkovas G. Lippert T. David C. Wokaun A. Gobrecht J. Microelectron. Eng. 67-68 2003 438
24. Kopitkovas G. Lippert T. David C. Wokaun A. Gobrecht J. Thin Solid Films 453-454 2004 31
25. Tsuboi Y. Fukumura H. Masuhara H. Appl. Phys. Lett. 64 1994 2745
26. Tsuboi Y. Hatanaka K. Fukumura H. Masuhara H. J. Phys. Chem. 98 1994 11237