Very deep fused silica etching

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4984, Issue , 2003, Pages 234-243

  Steingoetter, Ingo ^a   Grosse, Axel ^b   Fouckhardt, Henning ^a  

^a Rheinland Pfälzische Technische Universität Kaiserslautern Landau   (Germany)

^b ROBERT BOSCH GMBH   (Germany)

Author keywords

Capillary electrophoresis; Extended path cell; Fused silica; Hard mask; Hyper Rayleigh scattering; Leaky optical waveguide; Mask fabrication; Soft mask; Very deep wet dry etching

Indexed keywords

ELECTROPHORESIS; FUSED SILICA; PHOTORESISTS; RAYLEIGH SCATTERING; WAVEGUIDES;

SOFT MASKS;

ETCHING;

EID: 0038734053     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.477833     Document Type: Conference Paper

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