Ablation of silica glass using pulsed laser plasma soft X-rays

Surface Science

Volumn 593, Issue 1-3, 2005, Pages 248-251

  Makimura, T ^a   Kenmotsu, Y ^a   Miyamoto, H ^a   Niino, H ^b   Murakami, K ^a  

^a UNIVERSITY OF TSUKUBA   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Desorption induced by photon stimulation; Glass surfaces; Laser methods; Silicon oxides; Single crystal surfaces; Surface melting; X ray absorption spectroscopy

Indexed keywords

FUSED SILICA; IRRADIATION; LASER ABLATION; LASER PULSES; NEODYMIUM LASERS; X RAYS;

DESORPTION INDUCED BY PHOTON STIMULATION; GLASS SURFACES; LASER METHODS; PULSED LASER PLASMA SOFT X-RAYS; SILICON OXIDES; SINGLE CRYSTAL SURFACES; SURFACE MELTING;

SURFACE CHEMISTRY;

EID: 26444613865     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2005.06.067     Document Type: Conference Paper

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