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Applied Physics A: Materials Science and Processing

Volumn 76, Issue 5, 2003, Pages 751-753

Fabrication of submicron gratings in fused silica by F2-laser ablation

(7) Ihlemann, J a Muller S a Puschmann, S a Schafer D a Wei, M b Li, J b Herman, P R b

a LASER LABORATORIUM GÖTTINGEN E V (Germany)

b UNIVERSITY OF TORONTO (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; DIFFRACTION; DIFFRACTION GRATINGS; EXCIMER LASERS; LASER ABLATION; LIGHT ABSORPTION; MASKS; NANOTECHNOLOGY; OPTICAL SYSTEMS; SCANNING ELECTRON MICROSCOPY;

DEMAGNIFICATION; LASER BEAM DIFFRACTION; SCHWARZCHILD OBJECTIVE GENERATED GRATINGS; SUB-MICRON RELIEF GRATINGS; SUBMICRON GRATINGS; WAVELENGTH PROJECTION MASK;

FUSED SILICA;

EID: 0347925044 PISSN: 09478396 EISSN: None Source Type: Journal
DOI: 10.1007/s00339-002-1467-8 Document Type: Article

Times cited : (68)

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