Formation of microdots on the surface of densified silica glass by thermal relaxation

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 42, Issue 6 B, 2003, Pages

  Kitamura, Naoyuki ^a   Fukumi, Kohei ^a   Nishii, Junji ^a   Kinoshita, Takahiro ^b   Ohno, Nobuhito ^b  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b OSAKA ELECTRO COMMUNICATION UNIVERSITY   (Japan)

Author keywords

Densification; Laser irradiation; Silica glass; Structural relaxation; Texture

Indexed keywords

CARBON DIOXIDE; DENSIFICATION; HIGH TEMPERATURE EFFECTS; HOT ISOSTATIC PRESSING; LASER PULSES; LIGHT ABSORPTION; MICROOPTICS; PRESSURE EFFECTS; THERMAL DIFFUSION;

THERMAL RELAXATION;

FUSED SILICA;

EID: 0042383457     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.42.l712     Document Type: Article

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