Structural development and electronic properties of hot filament low pressure chemical vapor deposited fluorocarbon polymer films

Journal of Materials Research

Volumn 21, Issue 1, 2006, Pages 242-254

  Rastogi, A C ^a   Desu, S B ^a  

^a University of Massachusetts   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTROSCOPY; CHEMICAL VAPOR DEPOSITION; ELECTRON SPECTROSCOPY; ELECTRONIC PROPERTIES; FLUOROCARBONS; OXYGEN; PLASTIC FILAMENTS; POLYTETRAFLUOROETHYLENES; SUBSTRATES;

HOT FILAMENT; LOW PRESSURE CHEMICAL VAPOR DEPOSITION; POLYMER FILMS;

PLASTIC FILMS;

EID: 33644545697     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/jmr.2006.0021     Document Type: Article

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