E-Beam patterning of hot-filament CVD fluorocarbon films using supercritical CO2 as a developer

Chemical Vapor Deposition

Volumn 7, Issue 5, 2001, Pages 195-197

  Pryce Lewis, Hilton G ^a   Weibel, Gina L ^b   Ober, Christopher K ^b   Gleason, Karen K ^a  

^a Massachusetts Institute of Technology Cambridge   (United States)

^b Cornell University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000020599     PISSN: 09481907     EISSN: None     Source Type: Journal    
DOI: 10.1002/1521-3862(200109)7:5<195::AID-CVDE195>3.0.CO;2-E     Document Type: Article

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