Pulsed plasma enhanced and hot filament chemical vapor deposition of fluorocarbon films

Journal of Fluorine Chemistry

Volumn 104, Issue 1, 2000, Pages 119-126

  Lau, Kenneth K S ^a   Gleason, Karen K ^a  

^a USA   (United States)

Author keywords

Chemical vapor deposition; Fluorocarbon films; Hot filament; Pulsed plasma; Solid state 19F and 13C NMR

Indexed keywords

EID: 0001711492     PISSN: 00221139     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-1139(00)00234-7     Document Type: Article

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