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Volumn 104, Issue 1, 2000, Pages 119-126
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Pulsed plasma enhanced and hot filament chemical vapor deposition of fluorocarbon films
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Author keywords
Chemical vapor deposition; Fluorocarbon films; Hot filament; Pulsed plasma; Solid state 19F and 13C NMR
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Indexed keywords
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EID: 0001711492
PISSN: 00221139
EISSN: None
Source Type: Journal
DOI: 10.1016/S0022-1139(00)00234-7 Document Type: Article |
Times cited : (45)
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References (31)
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