Low dielectric constant fluorocarbon films

Materials Research Society Symposium - Proceedings

Volumn 544, Issue , 1999, Pages 209-220

  Lau, K K S ^a   Gleason, K K ^a  

^a Massachusetts Institute of Technology Cambridge   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; CHEMICAL BONDS; FLUOROCARBONS; NUCLEAR MAGNETIC RESONANCE SPECTROSCOPY; PERMITTIVITY; PHYSICAL PROPERTIES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYMERS; STRUCTURE (COMPOSITION);

PYROLYTIC CHEMICAL VAPOR DEPOSITION; SOLID STATE NUCLEAR MAGNETIC RESONANCE SPECTROSCOPY; THIN FLUORCARBON FILMS;

THIN FILMS;

EID: 0033338286     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (42)

1. K. Endo, MRS Bulletin, 22,55 ( 1997).
2. K Endo, T. Tatsumi, Y. Matsubara, T. Horiuchi, Jpn. J. Appl. Phys., Pt. l 37, 1809 (1998).
3. C. B. Labelle, K. K. Gleason, S. J. Limb, A. J. Burns, Mater. Res. Soc. Symp. Proc. 443, 189 (1997).
4. B. D. Ratner, A. Chikoti, O. P. Lopez, Plasma Deposition and Treatment for Biomédical Applications. In Plasma Deposition, Treatment, and Etching of Polymers; R. d'Agostino, Ed. ; (Academic Press: San Diego, 1990), p 463.
5. V. Panchalingam, B. ; Poon, H. H. Huo, C. R. Savage, R. B. Timmons, R. C. Eberhart, J. Biomater. Sei. Polymer Edn. 5, 131 (1993).
6. S. J. Limb, K. K. Gleason, D. J. Edell, E. F. Gleason, J. Vac. Sei. Technol. A 15, 1814 (1996).
7. J. P. Booth, G. Hancock, N. D. Perry, M. J. Toogood, J. Appl. Phys. 66,5251 ( 1989).
8. C. B. Labelle, S. J. Limb, K. K. Gleason, J. Appl. Phys., 82, 1784 (1997).
9. C. B. Labelle, K. K. Gleason, Environmental, Safety and Health Issues Associated With Low Dielectric Constant Films Grown By Chemical Vapor Deposition. In 193rd Meeting of The Electrochemical Society, San Diego, CA, May 3-8, 1998.
10. C. R. Savage, R. B. Timmons,. Chem. Mater., 3,575 (1991).
11. C. R. Savage, R. B. Timmons, J. W. Lin, Spectroscopic Characterization of Films Obtained in Pulsed Radio-Frequency Plasma Discharges of Fluorocarbon Monomers. In Advances in Chemistry Series; American Chemical Society: Washington, DC, 1993; Vol. 236, p 745.
12. J. -H. Wang, J. -J. Chen, R. B. Timmons, Chem. Mater. 8, 2212 (1996).
13. S. J. Limb, D. J. Edell, E. F. Gleason, K. K. Gleason, J. Appl. Polym. Sei. 67, 1489 (1998).
14. S. J. Limb, C. B. Labelle, K. K. Gleason, D. J. Edell, E. F. Gleason, Appl. Phys. Lett. 68, 2810 (1996).
15. H. Yasuda, Plasma Polymerization (Academic Press: Orlando, FL, 1985).
16. Plasma Deposition, Treatment,' and Etching of Polymers; R. d'Agostino, Ed. (Academic Press: San Diego, 1990).
17. K. K. S. Lau, K. K. Gleason, J. Phys. Chem. B, 101, 6839 (1997).
18. K. K. S. Lau, K. K. Gleason, J. Phys. Chem. B, 102,5977 ( 1998).
19. K. K. S. Lau, K. K. Gleason, J. Electrochem. Soc. (submitted).
20. W. T. Dixon, J. Chem. Phys., 77,1800 ( 1982).
21. J. M. Miller, Prog. NMR'Spectrosc. 28,255 ( 1996).
22. R. K. Harris, P. Jackson, Chem. Rev. 91, 1427 (1991).
23. S. F. Dec, R. A. Wind, G. E. Maciel, Macromolecules 20, 2754 (1987).
24. E. Katoh, S. Hiromi, Y. Kita, I. Ando, J. Mol. Struct. 355, 21 (1995).
25. C. Tonelli, V. Tortelli, J. Fluorine Chem. 67,125 (1994).
26. J. W. Emsley, L. Phillips, Prog. NMR Spectrosc. 7, 1 (1971).
27. V. Tortelii, C. Tonelli, C. Corvaja, J. Fluorine Chem. 60, 165 (1993).
28. A. D. English, O. T. Garza, Macromolecules 12, 351 (1979).
29. S. J. Limb, Ph. D. Thesis, Massachusetts Institute of Technology, 1997.
30. W. Mahler, R. R. Resnick, J. Fluorine Chem., 3,451 (1973).
31. P. B. Sargeant, J. Org. Chem. 35, 678 (1970).
32. M. B. Knickelbein, D. A. Webb, E. R. Grant, (Mater. Res. Soc. Symp. Proc. 38, 1985) p. 23.
33. C. B. Labelle, S. M. Karecki, R. L. Reif, K. K. Gleason,. J. Vac. Sei. Technol. A (submitted).
34. N. Ishikawa, M. Manila, Nippon Kagaku Kaishi 10, 1411 ( 1997).
35. D. W. Ovenall, J. J. Chang,. J. Magn. Reson. 25, 361 (1997).
36. S. Kaplan, A. Dilks, J. Appl. Polym. Sei. : Appl. Polym. Symp. 38, 105 (1984).
37. T. Mallouk, B. L. Hawkins, M. P. Conrad, K. Zum, G. E. Maciel, N. Bartlett, Phil. Trans. R. Soc. Lond. A 314, 179(1985).
38. U. Schwerk, F. Engelke, R. Kleber, D. Michel, Thin Solid Films 230, 102 (1993).
39. E. W. Hagaman, O. K. Murray, G. D. Del Cul, Energy Fuels 12,399 (1998).
40. E. Kay, J. Coburn, A. Dilks, Plasma Chemistry of Ruorocarbons as Related to Plasma Etching and Plasma Polymerization. In Topics in Current Chemistry; S. Veprek, M. Venugopalan, Eds. (Springer-Verlag: Berlin, 1980) 94, p 1.
41. D. R. J. Burgess, M. R. Zachariah, W. Tsang, P. R. Westmoreland, Prog. Energy Combust. Sei. 21,453(1996).
42. H. Millauer, W. Schwertfeger, G. Siegemund, Angew. Chem. Int. Ed. Engl. 24, 161 (1985).