Extreme ultraviolet lithography capabilities at the advanced light source using a 0.3-NA optic

IEEE Journal of Quantum Electronics

Volumn 42, Issue 1, 2006, Pages 44-50

  Naulleau, Patrick ^a   Goldberg, Kenneth A ^b   Cain, Jason P ^c   Anderson, Erik H ^b   Dean, Kim R ^d   Denham, Paul ^b   Hoef, Brian ^b   Jackson, Keith H ^b  

^a STATE UNIVERSITY OF NEW YORK   (United States)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^c ADVANCED MICRO DEVICES   (United States)

^d SEMATECH   (United States)

Author keywords

Extreme ultraviolet (EUV); Lithography

Indexed keywords

LIGHT SOURCES; LITHOGRAPHY; MATHEMATICAL MODELS; NANOTECHNOLOGY;

EXTREME ULTRAVIOLET LITHOGRAPHY; NANOELECTRONICS;

ULTRAVIOLET RADIATION;

EID: 31844442760     PISSN: 00189197     EISSN: None     Source Type: Journal    
DOI: 10.1109/JQE.2005.858450     Document Type: Article

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