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1
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0942300018
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"Demonstration of 20 nm half-pitch spatial resolution with soft X-ray microscopy"
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W. Chao, E. Anderson, G. Denbeaux, B. Harteneck, A. Pearson, D. Olynick, F. Salmassi, C. Song, and D. Attwood, "Demonstration of 20 nm half-pitch spatial resolution with soft X-ray microscopy," J. Vac. Sci. Technol. B 21, 3108-3111 (2003).
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Chao, W.1
Anderson, E.2
Denbeaux, G.3
Harteneck, B.4
Pearson, A.5
Olynick, D.6
Salmassi, F.7
Song, C.8
Attwood, D.9
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2
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1642555615
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"XM-1: The high-resolution soft x-ray microscope at the Advanced Light Source"
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A. Pearson, W. Chao, G. Denbeaux, T. Eimueller, P. Fischer, L. Johnson, M. Koehler, C. Larabell, M. Le Gros, D. Yager, and D. Attwood, "XM-1: the high-resolution soft x-ray microscope at the Advanced Light Source," Proc. SPIE 4146, 54-59 (2000).
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Pearson, A.1
Chao, W.2
Denbeaux, G.3
Eimueller, T.4
Fischer, P.5
Johnson, L.6
Koehler, M.7
Larabell, C.8
Le Gros, M.9
Yager, D.10
Attwood, D.11
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3
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0942300070
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"At-wavelength interferometry of the 0.3 NA MET optic"
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K. Goldberg, P. Naulleau, P. Denham, S. Rekawa, K. Jackson, E. Anderson, J. Liddle, and J. Bokor, "At-wavelength interferometry of the 0.3 NA MET optic," J. Vac. Sci. Technol. B 21, 2706-2710 (2003).
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J. Vac. Sci. Technol. B
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, pp. 2706-2710
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Goldberg, K.1
Naulleau, P.2
Denham, P.3
Rekawa, S.4
Jackson, K.5
Anderson, E.6
Liddle, J.7
Bokor, J.8
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4
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0035519498
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"At wavelength characterization of the Engineering Test Stand Set-2 optic"
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P. Naulleau, K. Goldberg, E. Anderson, P. Batson, P. Denham, S. Rekawa, and J. Bokor, "At wavelength characterization of the Engineering Test Stand Set-2 optic," J. Vac. Sci. Technol. B 19, 2396-2400 (2001).
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Naulleau, P.1
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Batson, P.4
Denham, P.5
Rekawa, S.6
Bokor, J.7
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5
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0036883171
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"Sub-70-nm EUV lithography at the Advanced Light Source Static Microfield Exposure Station using the ETS Set-2 optic"
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P. Naulleau, K. Goldberg, E. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Harteneck, B. Hoef, K. Jackson, D. Olynick, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, P. Mirkarimi, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, D. O'Connell, R. Stulen, D. Tichenor, C. Gwyn, P. Yan, and G. Zhang, "Sub-70-nm EUV lithography at the Advanced Light Source Static Microfield Exposure Station using the ETS Set-2 optic," J. Vac. Sci. Technol. B 20 2829-2833 (2002).
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Naulleau, P.1
Goldberg, K.2
Anderson, E.3
Attwood, D.4
Batson, P.5
Bokor, J.6
Denham, P.7
Gullikson, E.8
Harteneck, B.9
Hoef, B.10
Jackson, K.11
Olynick, D.12
Rekawa, S.13
Salmassi, F.14
Blaedel, K.15
Chapman, H.16
Hale, L.17
Mirkarimi, P.18
Soufli, R.19
Spiller, E.20
Sweeney, D.21
Taylor, J.22
Walton, C.23
O'Connell, D.24
Stulen, R.25
Tichenor, D.26
Gwyn, C.27
Yan, P.28
Zhang, G.29
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14544293199
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CODE V is a registered trademark of Optical Research Associates, 3280 E. Foothill Blvd., Pasadena, CA 91107
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CODE V is a registered trademark of Optical Research Associates, 3280 E. Foothill Blvd., Pasadena, CA 91107.
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8
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14544278048
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Technical information on the DDC112 analog-to-digital current converter can be found on the Texas Instruments web site at
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Technical information on the DDC112 analog-to-digital current converter can be found on the Texas Instruments web site at http://focus.ti.com/ docs/prod/folders/print/ddc112.html.
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