A design study for synchrotron-based high-numerical-aperture scanning illuminators

Optics Communications

Volumn 234, Issue 1-6, 2004, Pages 53-62

  Naulleau, Patrick P ^a   Denham, Paul E ^a   Hoef, Brian ^a   Rekawa, Senajith ^a  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

Coherence; Condenser; Extreme ultraviolet; Lithography; Microscopy; Synchrotron

Indexed keywords

CAPACITORS; LITHOGRAPHY; OPTICAL COMMUNICATION; SCANNING; SYNCHROTRON RADIATION; SYNCHROTRONS; ULTRAVIOLET RADIATION; X RAY SPECTROSCOPY;

EXTREME ULTRAVIOLET (EUV); NUMERICAL APERTURE (NA);

ILLUMINATION METERS;

EID: 1842510700     PISSN: 00304018     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.optcom.2004.02.021     Document Type: Article

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