Extreme ultraviolet microexposures at the advanced light source using the 0.3 numerical aperture micro-exposure tool optic

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 22, Issue 6, 2004, Pages 2962-2965

  Naulleau, Patrick P ^a   Goldberg, Kenneth A ^a   Anderson, Erik ^a   Cain, Jason P ^b   Denham, Paul ^a   Jackson, Keith ^a   Morlens, Anne Sophie ^a   Rekawa, Seno ^a   Salmassi, Farhad ^a  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EXTREME ULTRAVIOLET (EUV); MICRO-EXPOSURE TOOLS (MET); NUMERICAL APERTURES (NA); STATIC PRINTING STATIONS;

COMPUTER AIDED DESIGN; LASERS; LIGHT PROPAGATION; MATHEMATICAL MODELS; MICROOPTICS; OPTIMIZATION; PRINTING; ULTRAVIOLET RADIATION;

LITHOGRAPHY;

LASERS; LITHOGRAPHY; MATHEMATICAL MODELS; OPTIMIZATION; PRINTING; ULTRAVIOLET RADIATION;

EID: 13244294226     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1802851     Document Type: Conference Paper

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