Sub-70 nm extreme ultraviolet lithography at the advanced light source static microfield exposure station using the engineering test stand set-2 optic

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 20, Issue 6, 2002, Pages 2829-2833

  Naulleau, Patrick ^a   Goldberg, Kenneth A ^a   Anderson, Erik H ^a   Attwood, David ^b   Batson, Phillip ^a   Bokor, Jeffrey ^a,b   Denham, Paul ^a   Gullikson, Eric ^a   Harteneck, Bruce ^a   Hoef, Brian ^a   Jackson, Keith ^a   Olynick, Deirdre ^a   Rekawa, Seno ^a   Salmassi, Farhad ^a   Blaedel, Ken ^c   Chapman, Henry ^c   Hale, Layton ^c   Mirkarimi, Paul ^c   Soufli, Regina ^c   Spiller, Eberhard ^c   Sweeney, Don ^c   Taylor, John ^c   Walton, Chris ^c   O'Connell, Donna ^d   Tichenor, Daniel ^d   Gwyn, Charles W ^e   Yan, Pei Yang ^e   Zhang, Guojing ^e   more..

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

^c LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

^d SANDIA NATIONAL LABORATORIES   (United States)

^e INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

IMAGE QUALITY; INTERFEROMETERS; LIGHT SOURCES; OPTICS; REFRACTION; SYNCHROTRON RADIATION;

SPACE PRINTING; STATIC PRINTING; ULTRAVIOLET LITHOGRAPHY;

LITHOGRAPHY;

EID: 0036883171     PISSN: 0734211X     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1524976     Document Type: Article

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