Lithographic aerial-image contrast measurement in the extreme ultraviolet engineering test stand

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 20, Issue 6, 2002, Pages 2849-2852

  Lee, Sang H ^a   Tichenor, Daniel A ^b   Naulleau, Patrick ^c  

^a INTEL CORPORATION   (United States)

^b SANDIA NATIONAL LABORATORIES   (United States)

^c LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; IMAGE ANALYSIS; MATHEMATICAL MODELS; NUMERICAL METHODS;

AERIAL IMAGE CONTRAST MEASUREMENT; EXTREME ULTRAVIOLET ENGINEERING TEST STAND; RESIST CLEARING METHOD;

LITHOGRAPHY;

EID: 0036883175     PISSN: 0734211X     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1526354     Document Type: Article

References (10)

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