Sub-100-nm lithographic imaging with an EUV 10× microstepper

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3676, Issue I, 1999, Pages 264-271

  Goldsmith, John E M ^a   Berger, Kurt W ^a   Bozman, Danny R ^a   Cardinale, Gregory F ^a   Folk, Daniel R ^a   Henderson, Craig C ^a   O'Connell, Donna J ^a   Ray Chaudhuri, Avijit K ^a   Stewart, Kenneth D ^a   Tichenor, Daniel A ^a   Chapman, Henry N ^a   Gaughan, Richard ^a   Hudyma, Russell M ^a   Montcalm, Claude ^a   Spiller, Eberhard A ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DENSITY (OPTICAL); IMAGE QUALITY; IMAGING TECHNIQUES; MEASUREMENT ERRORS; OPTICS; ULTRAVIOLET RADIATION; WAVEFRONTS;

EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL); MICROSTEPPERS;

PHOTORESISTS;

EID: 0032629235     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (15)