Chemical mapping of polymer photoresists by scanning transmission x-ray microscopy

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 23, Issue 4, 2005, Pages 1630-1636

  Muntean, Ligia ^a   Planques, Romain ^a,d   Kilcoyne, A L D ^b   Leone, Stephen R ^a,b   Gilles, Mary K ^b   Hinsberg, William D ^c  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^c IBM ALMADEN RESEARCH CENTER   (United States)

^d ECOLE NORMALE SUPÉRIEURE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL MAPPING; CHEMICAL SELECTIVITY; POLYMER PHOTORESISTS;

CHEMICAL ANALYSIS; ELECTRON TRANSITIONS; IMAGING TECHNIQUES; ORGANIC POLYMERS;

PHOTORESISTS;

EID: 31144457101     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1978899     Document Type: Article

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