Potentials and challenges for lithography beyond 193 nm optics

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 15, Issue 6, 1997, Pages 2109-2111

  Canning, John ^a  

^a SEMATECH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SOFTWARE; DATABASE SYSTEMS; DECISION SUPPORT SYSTEMS; ELECTRONICS INDUSTRY; INFORMATION TECHNOLOGY; INTERNATIONAL COOPERATION; MASKS; OPTICS; SOCIETIES AND INSTITUTIONS;

MICROLITHOGRAPHY; SEMATECH PROGRAM;

LITHOGRAPHY;

EID: 0031276663     PISSN: 0734211X     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589229     Document Type: Article

References (0)