Chemical mapping of patterned polymer photoresists by near-field infrared microscopy

Applied Surface Science

Volumn 175-176, Issue , 2001, Pages 783-789

  Dragnea, Bogdan ^a   Preusser, Jan ^a   Szarko, Jodi M ^a   McDonough, Laurie A ^a   Leone, Stephen R ^a   Hinsberg, William D ^b  

^a UNIVERSITY OF COLORADO   (United States)

^b IBM ALMADEN RESEARCH CENTER   (United States)

Author keywords

Photoacid catalyzed; Photoresists; Polymer

Indexed keywords

LITHOGRAPHY; MICROSCOPIC EXAMINATION; POLYMERS;

NEAR FIELD INFRARED MICROSCOPY; PATTERNED POLYMER PHOTORESISTS;

PHOTORESISTS;

EID: 17944400003     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(01)00068-X     Document Type: Article

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