X-ray lithography: Status, challenges, and outlook for 0.13 μm

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 15, Issue 6, 1997, Pages 2117-2124

  Silverman, Jerome P ^a  

^a IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000159545     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589231     Document Type: Article

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