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Volumn 496, Issue 2, 2006, Pages 346-352

Atomic layer deposition and post-deposition annealing of PbTiO3 thin films

Author keywords

Atomic layer deposition; Lead titanate

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; DEPOSITION; LEAD COMPOUNDS; OXYGEN; STOICHIOMETRY; WATER;

EID: 28144458577     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.09.026     Document Type: Article
Times cited : (48)

References (67)
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  • 61
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  • 62
    • 0003495856 scopus 로고    scopus 로고
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  • 65
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    • 0003495856 scopus 로고    scopus 로고
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    • Joint Committee on Powder Diffraction Standards, Card 21-1276
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.