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Volumn 8, Issue 5, 2002, Pages 195-197

Low-temperature ALD growth of SrTiO3 thin films from Sr β-diketonates and Ti alkoxide precursors using oxygen remote plasma as an oxidation source

(3) Kil, Deok Sin a Lee, Jong Min a Roh, Jae Sung a

a Hynix Semiconductor Inc (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITORS; CHEMICAL VAPOR DEPOSITION; DEPOSITION; DIELECTRIC MATERIALS; OXIDATION; PERMITTIVITY; RANDOM ACCESS STORAGE; STRONTIUM COMPOUNDS; TITANIUM COMPOUNDS;

DYNAMIC RANDOM ACCESS MEMORY (DRAM); OXIDATION SOURCES; OXYGEN REMOTE PLASMAS; SRTIO3;

THIN FILMS;

EID: 0040672018 PISSN: 09481907 EISSN: None Source Type: Journal
DOI: 10.1002/1521-3862(20020903)8:5<195::AID-CVDE195>3.0.CO;2-9 Document Type: Article

Times cited : (47)

References (9)

1
- 0032680399
- D. E. Kotecki, J. D. Baniecki, H. Shen, R. B. Laibowitz, K L. Saenger, J. J. Lion, T. M Shaw, S. D Athavale, C C. Cabral, Jr., P. R Duncombe, M. Gutshe, G. Kunkel, Y.-J Park, Y. Y. Wang, R. Wise, IBM J. Res. Dev. 1999, 3, 367.
- (1999) IBM J. Res. Dev. , vol.3 , pp. 367
- Kotecki, D.E.¹ Baniecki, J.D.² Shen, H.³ Laibowitz, R.B.⁴ Saenger, K.L.⁵ Lion, J.J.⁶ Shaw, T.M.⁷ Athavale, S.D.⁸ Cabral Jr., C.C.⁹ Duncombe, P.R.¹⁰ Gutshe, M.¹¹ Kunkel, G.¹² Park, Y.-J.¹³ Wang, Y.Y.¹⁴ Wise, R.¹⁵

2
- 0002678712
- M. Vehkamaki, T. Hatapaa, T Hannienen, M. Litala, M. Leskela, T. Sajavaara, E. Rauhala, J. Keinonen, Chem Vap. Deposition 2001, 7, 75.
- (2001) Chem Vap. Deposition , vol.7 , pp. 75
- Vehkamaki, M.¹ Hatapaa, T.² Hannienen, T.³ Litala, M.⁴ Leskela, M.⁵ Sajavaara, T.⁶ Rauhala, E.⁷ Keinonen, J.⁸

3
- 0001309927
- M. Yamamuka, T Kawahara, M. Tarutani, T. Honkawa, T. Oomori, K. Ono, J. Appl. Phys. 1999, 86, 1082.
- (1999) J. Appl. Phys. , vol.86 , pp. 1082
- Yamamuka, M.¹ Kawahara, T.² Tarutani, M.³ Honkawa, T.⁴ Oomori, T.⁵ Ono, K.⁶

4
- 0030234306
- C. S. Kang, C. S. Hwang, H. J Cho, B. T. Lee, S. O. Park, J. W Kim, H. Hori, S. I. Lee, Y. B. Koh, M Y. Lee, Jpn. J. Appl. Phys. 1996, 35, 4890.
- (1996) Jpn. J. Appl. Phys. , vol.35 , pp. 4890
- Kang, C.S.¹ Hwang, C.S.² Cho, H.J.³ Lee, B.T.⁴ Park, S.O.⁵ Kim, J.W.⁶ Hori, H.⁷ Lee, S.I.⁸ Koh, Y.B.⁹ Lee, M.Y.¹⁰

5
- 0000638237
- T. Kawahara, S. Matsuno, M Yamamuka, M. Tarutani, T. Sato, T. Horikawa, F. Uchikawa, K. Ono, Jpn. J. Appl. Phys. 1999, 38, 2205
- (1999) Jpn. J. Appl. Phys. , vol.38 , pp. 2205
- Kawahara, T.¹ Matsuno, S.² Yamamuka, M.³ Tarutani, M.⁴ Sato, T.⁵ Horikawa, T.⁶ Uchikawa, F.⁷ Ono, K.⁸

6
- 0034525113
- D. J. Otway, W. S. Rees, Jr., Coord. Chem. Rev. 2000, 210, 279.
- (2000) Coord. Chem. Rev. , vol.210 , pp. 279
- Otway, D.J.¹ Rees Jr., W.S.²

7
- 0034229297
- J. Aank, A Aidla, T. Uustare, M. Ritala, M. Leskela, Appl. Surf. Sci. 2000, 161, 385.
- (2000) Appl. Surf. Sci. , vol.161 , pp. 385
- Aank, J.¹ Aidla, A.² Uustare, T.³ Ritala, M.⁴ Leskela, M.⁵

8
- 0032784780
- O. Nilsen, M. Peussa, H Fjellvag, L. Niinisto, A. Kjekshus, J. Mater. Chem. 1999, 9, 1781.
- (1999) J. Mater. Chem. , vol.9 , pp. 1781
- Nilsen, O.¹ Peussa, M.² Fjellvag, H.³ Niinisto, L.⁴ Kjekshus, A.⁵

9
- 0031546897
- M A. Herman, Appl. Surf. Sci. 1997, 112, 1.
- (1997) Appl. Surf. Sci. , vol.112 , pp. 1
- Herman, M.A.¹

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