Growth of metal oxide thin films by laser-induced metalorganic chemical vapor deposition

Journal of Applied Physics

Volumn 80, Issue 12, 1996, Pages 7073-7083

  Tokita, Koji ^a   Okada, Fumio ^a  

^a JAPAN ENERGY CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EXCIMER LASERS; FABRICATION; FILM GROWTH; GASES; IRRADIATION; LIGHT ABSORPTION; METALLORGANIC CHEMICAL VAPOR DEPOSITION; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING LEAD COMPOUNDS; SPECTROPHOTOMETERS; SUBSTRATES; SURFACE ROUGHNESS;

EXCIMER LASER IRRADIATION; FIELD EMISSION SCANNING ELECTRON MICROSCOPE; GAS PHASE DIFFUSION; LASER INDUCED METALLORGANIC CHEMICAL VAPOR DEPOSITION; LASER POWER DEPENDENCE MEASUREMENTS; METAL OXIDE THIN FILMS; X RAY PHOTOELECTRON SPECTROMETER;

THIN FILMS;

EID: 0030412142     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.363718     Document Type: Article

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