Effect of oxygen pressure upon composition variation during chemical vapor deposition growth of lead titanate films from tetraethyl lead and titanium tetraisopropoxide

Materials Letters

Volumn 46, Issue 2-3, 2000, Pages 149-153

  Hong, Lu Sheng ^a   Wei, Chung Chieh ^a  

^a NATIONAL TAIWAN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

BINARY MIXTURES; CHEMICAL REACTORS; CHEMICAL VAPOR DEPOSITION; CRYSTALLINE MATERIALS; FERROELECTRIC MATERIALS; FILM GROWTH; LEAD COMPOUNDS; OXYGEN; STOICHIOMETRY; X RAY DIFFRACTION ANALYSIS;

LOW-PRESSURE CHEMICAL VAPOR DEPOSITION (LPCVD);

DIELECTRIC FILMS;

EID: 0034317597     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-577X(00)00159-2     Document Type: Article

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