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Chemical Vapor Deposition

Volumn 6, Issue 3, 2000, Pages 139-145

Atomic layer CVD in the Bi-Ti-O system

(5) Schuisky, Mikael a Kukli, Kaupo b,c Ritala, Mikko b Hårsta, Anders a Leskelä, Markku b

a UPPSALA UNIVERSITY (Sweden)

b UNIVERSITY OF HELSINKI (Finland)

c UNIVERSITY OF TARTU (Estonia)

Author keywords

Atomic layer CVD; Atomic layer epitaxy; Bi Ti O system; Bismuth titanate; Thin films

Indexed keywords

EID: 0000303309 PISSN: 09481907 EISSN: None Source Type: Journal
DOI: 10.1002/(SICI)1521-3862(200006)6:3<139::AID-CVDE139>3.0.CO;2-T Document Type: Article

Times cited : (49)

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