Vapor-phase adsorption kinetics of 1-decene on hydrogenated Si(1 1 1)

Surface Science

Volumn 596, Issue 1-3, 2005, Pages 21-38

  Kosuri, Madhava R ^a   Gerung, Henry ^a   Li, Qiming ^a   Han, Sang M ^a   Herrera Morales, Paulo E ^b   Weaver, Jason F ^b  

^a University of New Mexico   (United States)

^b University of Florida   (United States)

Author keywords

Adsorption kinetics; Alkenes; Density functional theory; Infrared absorption spectroscopy; Self assembly; Silicon

Indexed keywords

CONTACT ANGLE; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDROGENATION; MATHEMATICAL MODELS; MONOLAYERS; OLEFINS; PROBABILITY DENSITY FUNCTION; REACTION KINETICS; SILICON; X RAY PHOTOELECTRON SPECTROSCOPY;

INFRARED ADSORPTION KINETICS; SESSILE-DROP; TEMPERATURE RANGE; VAPOR-PHASE ADSORPTION;

ADSORPTION;

EID: 27744442895     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2005.08.021     Document Type: Article

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