Newly developed polymer bound photoacid generator resist for sub-100 nm pattern by EUV lithography

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5753, Issue II, 2005, Pages 771-777

  Gonsalves, Kenneth E ^a,b   Thiyagarajan, Muthiah ^a   Dean, Kim ^c  

^a Cameron Applied Research Center   (United States)

^b UNIVERSITY OF NORTH CAROLINA AT CHARLOTTE   (United States)

^c SEMATECH   (United States)

Author keywords

Contrast; Covalent PAG; EUV lithography; Ionic PAG; PHOST; Polymer bound PAG; Sensitivity

Indexed keywords

CONTRAST; COVALENT PAG; EXTREME UV (EUV) LITHOGRAPHY; IONIC PAG; PHOST; POLYMER BOUND PAG; SENSITIVITY;

ACIDS; FREE RADICAL POLYMERIZATION; IONS; PHASE SEPARATION; POLYMERS; PROBLEM SOLVING; SAMPLING; SENSITIVITY ANALYSIS; SYNTHESIS (CHEMICAL); ULTRAVIOLET RADIATION;

PHOTORESISTS;

EID: 24644432414     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.602087     Document Type: Conference Paper

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