Sulfonic acid generating polymers for 146 nm irradiation

Journal of Photopolymer Science and Technology

Volumn 12, Issue 5, 1999, Pages 721-724

  Masamitsu Shirai, Toyofumi Shinozuka ^a   Tsunooka, Masahiro ^a  

^a Osaka Prefecture University   (Japan)

Author keywords

146 nm light; Imino sulfonate; Photoacid generator; Sulfonic acid; Vuv exposure

Indexed keywords

EID: 0010120121     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.12.721     Document Type: Article

References (9)

1. H. Ito, E. Reichmanis, 0. Nalamasu and T. Ueno, Micro- and Nanopatterning Polymers, American Chemistry Society, Washington D.C. (1998).
2. T. Matsuo, M. Endo, M. Shirai and M. Tsunooka, J. Pholopolym. Sci. Technol., 10 (1997) 595.
3. M. Shirai, N. Nogi and M. Tsunooka, Reactive Functional Polym., 37 (1998) 147.
4. K. H. Chae, Y. J. Oh, J. Pholopolym. Sci. Technol., 7 (1994) 183.
5. M. Shirai, T. Yamamoto and M. Tsunooka, Polym. Degrad. Stab., 63 (1999) 481.
6. M. Shirai, T. Sumino and M. Tsunooka, Eur. Polym. J., 33(1997) 1255.
7. U. Okoroanyamvu, J. D. Byers, T. Cao, S. E. Webber and C. G. Willson, Pmc. SPIE. 3333 (1998) 747.
8. L. L. Hench and J. K. West, Chem. Rev., 90 (1990)33.
9. M. Shirai, J. Nakanishi, M. Tsunooka, T. Matsuo and M. Endo, J. Pholopolym. Sci. Technol., 11 (1998)641.