Researching photoresist materials for F2 (157nm) and EUV (13nm)

Microlithography World

Volumn 9, Issue 4, 2000, Pages 20-22,-28

  Matsuzawa, Nobuyuki N ^a   Okazaki, Shinji ^a   Ishitani, Akihiko ^a  

^a ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

LIGHT ABSORPTION; PHOTOLITHOGRAPHY; PHOTONS; POLYMETHYL METHACRYLATES; ULTRAVIOLET RADIATION;

CHEMICAL SIMULATIONS; CRITICAL DIMENSION CONTROL; NEXT GENERATION LITHOGRAPHY; PHOTOACIDS; POLYHYDROXYSTYRENE; TOP SURFACE IMAGING;

PHOTORESISTS;

EID: 0034262432     PISSN: 1074407X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (25)