New resists for nanometer scale patterning by extreme ultraviolet lithography

Journal of Microlithography, Microfabrication and Microsystems

Volumn 4, Issue 2, 2005, Pages 1-6

  Gonsalves, Kenneth E ^a   Thiyagarajan, Muthiah ^a   Dean, Kim ^b  

^a UNIVERSITY OF NORTH CAROLINA AT CHARLOTTE   (United States)

^b SEMATECH   (United States)

Author keywords

Blend resist; Chemically amplified resist; Extreme ultraviolet; Photoacid generator

Indexed keywords

BLEND RESIST; CHEMICALLY AMPLIFIED RESIST; EXTREME ULTRAVIOLET; PHOTOACID GENERATOR;

NANOTECHNOLOGY; PHOTORESISTORS; POLYMER BLENDS; SYNTHESIS (CHEMICAL); ULTRAVIOLET RADIATION;

LITHOGRAPHY;

EID: 24644515091     PISSN: 15371646     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.1898604     Document Type: Article

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