High-performance EB chemically amplified resist using alicyclic protective groups

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3999, Issue , 2000, Pages

  Kon, Jun ichi ^a   Nozaki, Koji ^a   Namiki, Takahisa ^a   Yano, Ei ^a  

^a FUJITSU LABORATORIES LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ADDITIVES; ELECTRON BEAM LITHOGRAPHY; HYDROPHOBICITY; PLASMA ETCHING; POLYACRYLATES; VINYL RESINS;

CHEMICAL AMPLIFICATION; PHOTOACID GENERATORS (PAG); POLYMETHACRYLATE; POLYVINYLPHENOL;

PHOTORESISTS;

EID: 0033727409     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (12)