Photospeed considerations for extreme ultraviolet lithography resists

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 20, Issue 6, 2002, Pages 2962-2967

  Dentinger, Paul M ^a   Hunter, Luke L ^a   O'Connell, Donna J ^a   Gunn, Scott ^a   Goods, Daniel ^a   Fedynyshyn, Theodore H ^b   Goodman, Russell B ^b   Astolfi, David K ^b  

^a SANDIA NATIONAL LABORATORIES   (United States)

^b MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACRYLICS; COMPOSITION; DISSOLUTION; POLYSTYRENES; SCANNING ELECTRON MICROSCOPY; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET LITHOGRAPHY RESISTS; LINE-EDGE ROUGHNESS; PHOTOACID GENERATOR; PHOTOSPEED;

PHOTORESISTS;

EID: 0036883194     PISSN: 0734211X     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1520561     Document Type: Article

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