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Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4345, Issue 1, 2001, Pages 776-783

Design and performance of photoresist materials for ArF lithography

(16) Kim, Hyun Woo a Jung, Dong Won a Lee, Sook a Choi, Sang Jun a Woo, Sang Gyun a Kavanagh, Robert J b Barclay, George b Blacksmith, Bob b Kang, Doris b Pohlers, Gerd b Cameron, Jim b Mattia, Joe b Caporale, Stefan b Penniman, Thomas b Joesten, Lori b Thackeray, James W b

a SAMSUNG Electronics (South Korea)

b SHIPLEY COMPANY (United States)

Author keywords

ArF; Chemically amplified resist; Cycloolefin polymer; Lithography; Methacrylate polymer; Photoresist; VEMA

Indexed keywords

COPOLYMERS; ETCHING; ETHERS; OLEFINS; POLYMERIZATION;

CYCLOOLEFIN POLYMERS;

PHOTORESISTS;

EID: 0010273245 PISSN: 0277786X EISSN: None Source Type: Journal
DOI: 10.1117/12.436908 Document Type: Article

Times cited : (8)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.