Design and Synthesis of New Photoresist Materials for ArF Lithography

Journal of Applied Polymer Science

Volumn 92, Issue 1, 2004, Pages 165-170

  Seo, Hwang Un ^a   Jin, Sung Ho ^a   Choi, Sang Jun ^b   Gal, Yeong Soon ^c   Lim, Kwon Taek ^d  

^a Pusan National University   (South Korea)

^b SAMSUNG Electronics   (South Korea)

^c Kyungil University   (South Korea)

^d Pukyong National University   (South Korea)

Author keywords

Block copolymers; Lithography; Photochemistry; Photoresists

Indexed keywords

ADHESION; BLOCK COPOLYMERS; CARBON INORGANIC COMPOUNDS; COLUMN CHROMATOGRAPHY; COPOLYMERIZATION; DRY ETCHING; ESTERIFICATION; EXCIMER LASERS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; NUCLEAR MAGNETIC RESONANCE SPECTROSCOPY; PHOTOCHEMICAL REACTIONS; PHOTORESISTS; PURIFICATION; SYNTHESIS (CHEMICAL);

PHOTOACID GENERATORS (PAG); PHOTORESIST MATERIALS;

ORGANIC POLYMERS;

POLYMER;

EID: 1542683012     PISSN: 00218995     EISSN: None     Source Type: Journal    
DOI: 10.1002/app.13701     Document Type: Article

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