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Journal of Photopolymer Science and Technology

Volumn 15, Issue 4, 2002, Pages 673-676

Chemically amplified main chain scission: New concept to reduce line edge roughness and outgassing

(4) Eschbaumer, Christian a Heusinger, Nicole a Hohle, Christoph a Sebald, Michael a

a INFINEON TECHNOLOGIES AG (Germany)

Author keywords

Line Edge Roughness; Main Chain Scission; Outgassing; Polycarbonate

Indexed keywords

POLYCARBONATE;

ARTICLE; CHEMICAL STRUCTURE; DEPOLYMERIZATION; LINE EDGE ROUGHNESS; LITHOGRAPHY; PHOTOLYSIS; SOLUBILITY; TECHNOLOGY; TEMPERATURE; ULTRAVIOLET RADIATION;

EID: 0036355559 PISSN: 09149244 EISSN: None Source Type: Journal
DOI: 10.2494/photopolymer.15.673 Document Type: Article

Times cited : (10)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.