Kinetics of etching in inductively coupled plasmas

Applied Surface Science

Volumn 228, Issue 1-4, 2004, Pages 245-256

  Kim, Min Tae ^a  

^a Korea Electric Power Research Institute (KEPRI)   (South Korea)

Author keywords

Etch characteristics; Inductively coupled plasma; Reactive ion etching; Surface kinetics model

Indexed keywords

CHEMICAL REACTORS; CONTROLLABILITY; ELECTRIC POTENTIAL; FLUOROCARBONS; MATHEMATICAL MODELS; REACTION KINETICS; REACTIVE ION ETCHING; SUBSTRATES;

ETCH CHARACTERISTICS; ETCH RATES; PLASMA REACTORS; SURFACE KINETICS MODEL;

INDUCTIVELY COUPLED PLASMA;

EID: 1942517779     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2004.01.021     Document Type: Article

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