Fluorocarbon polymer deposition kinetics in a low-pressure, high-density, inductively coupled plasma reactor

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 18, Issue 5, 2000, Pages 2122-2129

  Sowa, M J ^a   Littau, M E ^a   Pohray, V ^a   Cecchi, J L ^a  

^a University of New Mexico   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FLUOROCARBONS; INTERFEROMETERS; PLASMA ETCHING; POLYMERS; REACTION KINETICS; TOKAMAK DEVICES;

INDUCTIVELY COUPLED PLASMA (ICP) REACTORS; POLYMER DEPOSITION;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 0034272577     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1286396     Document Type: Article

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