Reactive ion etching of quartz and silica-based glasses in CF4/CHF3 plasmas

Vacuum

Volumn 55, Issue 3, 1999, Pages 191-196

  Leech, Patrick W ^a  

^a CSIRO   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; COMPOSITION; FLUORINE COMPOUNDS; MIXTURES; OXIDES; PLASMAS; QUARTZ; REACTIVE ION ETCHING;

ALKALI OXIDE; BIAS VOLTAGE; LOW EXPANSION GRADE; SPUTTER ETCHING;

GLASS;

EID: 0033333977     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(99)00146-3     Document Type: Article

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