Maskless lithography

Materials Today

Volumn 8, Issue 2, 2005, Pages 26-33

  Menon, Rajesh ^a,b   Patel, Amil ^a,b   Gil, Dario ^a,b,c   Smith, Henry I ^a,b  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

^b Lumarray   (United States)

^c IBM   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COSTS; ELECTRON BEAM LITHOGRAPHY; INTEGRATED CIRCUIT MANUFACTURE; ION BEAM LITHOGRAPHY; MASKS; NANOTECHNOLOGY; OPTICAL RESOLVING POWER; PHOTOLITHOGRAPHY; PROJECTION SYSTEMS; SEMICONDUCTOR DEVICE MANUFACTURE; THROUGHPUT;

INTERFERENCE LITHOGRAPHY (IL); MASKLESS LITHOGRAPHY; NANOSCALE SCIENCE; SCANNING ELECTRON-BEAM LITHOGRAPHY (SEBL); ZONE-PLATE-ARRAY LITHOGRAPHY (ZPAL);

LITHOGRAPHY;

EID: 12444257427     PISSN: 13697021     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1369-7021(05)00699-1     Document Type: Article

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