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Volumn 18, Issue 6, 2000, Pages 2881-2885

Lithographic patterning and confocal imaging with zone plates

Author keywords

[No Author keywords available]

Indexed keywords

IMAGING TECHNIQUES; OPTICAL PROPERTIES; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS; SUBSTRATES; ULTRAVIOLET RADIATION;

EID: 0034314708     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1321293     Document Type: Article
Times cited : (37)

References (15)
  • 5
    • 0342572042 scopus 로고    scopus 로고
    • note
    • These zone plates have subwavelength features sizes, and would therefore be best modeled with vector theory. However, previous work indicates that for 1:1 line:space ratios, the error introduced by the use of the scalar model is small (Ref. 15), so the simulations shown should be adequate.
  • 6
    • 0032674960 scopus 로고    scopus 로고
    • Emerging Lithographic Technologies 111
    • SPIE Bellingham, WA
    • D. J. D. Carter, D. Gil, R. Menon, I. J. Djomehri, and H. I. Smith, Emerging Lithographic Technologies 111, Proc. SPIE Vol. 3676 (SPIE Bellingham, WA, 1999), pp. 324-332.
    • (1999) Proc. SPIE , vol.3676 , pp. 324-332
    • Carter, D.J.D.1    Gil, D.2    Menon, R.3    Djomehri, I.J.4    Smith, H.I.5
  • 8
    • 0343441889 scopus 로고    scopus 로고
    • Photomask and X-ray Mask Technology IV
    • SPIE Bellingham, WA
    • F. Abboud et al., Photomask and X-ray Mask Technology IV, Proc. SPIE Vol. 3096 (SPIE Bellingham, WA, 1997), pp. 116-124.
    • (1997) Proc. SPIE , vol.3096 , pp. 116-124
    • Abboud, F.1
  • 9
    • 0032593558 scopus 로고    scopus 로고
    • 15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98
    • SPIE, Bellingham, WA
    • R. Dean, D. Alexander, J. Chabala, T. Coleman, C. Hartglass, M. Lu, C. Sauer, and S. Weaver, 15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98, Proc. SPIE Vol. 3665 (SPIE, Bellingham, WA, 1999), pp. 166-178.
    • (1999) Proc. SPIE , vol.3665 , pp. 166-178
    • Dean, R.1    Alexander, D.2    Chabala, J.3    Coleman, T.4    Hartglass, C.5    Lu, M.6    Sauer, C.7    Weaver, S.8
  • 10
    • 0002086374 scopus 로고
    • Laser Microlithography
    • SPIE, Bellingham, WA
    • M. L. Rieger, J. A. Schoeffel, and P. A. Warkentin, Laser Microlithography, Proc. SPIE Vol. 922 (SPIE, Bellingham, WA, 1988), pp. 55-64.
    • (1988) Proc. SPIE , vol.922 , pp. 55-64
    • Rieger, M.L.1    Schoeffel, J.A.2    Warkentin, P.A.3
  • 11
    • 0028737414 scopus 로고
    • 14th Annual BACUS Symposium on Photomask Technology and Management
    • SPIE, Bellingham, WA
    • B. J. Grenon, D. C. Defibaugh, D. M. Sprout, H. C. Hamaker, and P. D. Buck, 14th Annual BACUS Symposium on Photomask Technology and Management, Proc. SPIE Vol. 2322 (SPIE, Bellingham, WA, 1994), pp. 50-55.
    • (1994) Proc. SPIE , vol.2322 , pp. 50-55
    • Grenon, B.J.1    Defibaugh, D.C.2    Sprout, D.M.3    Hamaker, H.C.4    Buck, P.D.5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.