Maskless extreme ultraviolet lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 6, 1999, Pages 3047-3051

  Choksi, Neha ^a   Pickard, D S ^a   McCord, Mark ^a   Pease, R F W ^a   Shroff, Yashesh ^b   Chen, Yijian ^b   Oldham, William ^b   Markle, David ^c  

^a STANFORD UNIVERSITY   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

^c Ultratech Stepper Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033272930     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590952     Document Type: Article

References (4)

1. Hawryluk, Sheldon, and Troccolo, OSA Trends Opt. Photonics 4, 54 (1996).
2. D. M. Bloom, SPIE - The International Society for Optical Engineering 3013, 165 (1997).
3. D. Lee, D. Newmark, K. Toh, P. Flanner, and A. R. Neureuther, SPLAT v5.0.
4. J. Younse, Proc. SPIE 2641, 64 (1995).