OML: Optical Maskless Lithography for economic design prototyping and small-volume production

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5377, Issue PART 2, 2004, Pages 777-787

  Sandstrom, Tor ^a   Bleeker, Arno ^b   Hintersteiner, Jason D ^b   Troost, Kars ^b   Freyer, Jorge ^a   Van Der Mast, Karel ^b  

^a Micronic Laser Systems AB   (Sweden)

^b ASML   (Netherlands)

Author keywords

Maskless Lithography; SLM

Indexed keywords

CMOS INTEGRATED CIRCUITS; COMPUTER SIMULATION; COSTS; CUSTOMER SATISFACTION; DATA FLOW ANALYSIS; EXCIMER LASERS; IMAGING TECHNIQUES; LIGHT MODULATORS; MICROELECTROMECHANICAL DEVICES; MIRRORS; OPTICAL SYSTEMS; SYSTEMS ANALYSIS;

FIELD OPTICS; MASKLESS LITHOGRAPHY; OPTICAL COLUMNS; SCANNERS;

PHOTOLITHOGRAPHY;

EID: 3843078450     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.537391     Document Type: Conference Paper

References (0)