Nanometer-level repeatable metrology using the Nanoruler

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 21, Issue 6, 2003, Pages 3097-3101

  Konkola, Paul T ^a   Chen, Carl G ^a   Heilmann, Ralf K ^a   Joo, Chulmin ^a   Montoya, Juan C ^a   Chang, Chih Hao ^a   Schattenburg, Mark L ^a  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BRAGG CELLS; DIFFRACTION GRATINGS; ERROR ANALYSIS; FEEDBACK CONTROL; FREQUENCY SYNTHESIZERS; HETERODYNING; INTERFEROMETERS; LIGHT INTERFERENCE; REFRACTOMETERS; SPURIOUS SIGNAL NOISE;

NANORULER SYSTEMS; SCANNING BEAM INTERFERENCE LITHOGRAPHY (SBIL);

PHOTOLITHOGRAPHY;

EID: 0942289205     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1610003     Document Type: Conference Paper

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