Method for reducing hyperbolic phase in interference lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 19, Issue 6, 2001, Pages 2347-2352

  Walsh, Michael E ^a   Smith, Henry I ^a  

^a Department of Electrical Engineering and Computer Science   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BENDING (DEFORMATION); CRYSTAL STRUCTURE; ELASTICITY; ETCHING; MOIRE FRINGES; REDUCTION; SILICON WAFERS; STRAIN; VECTORS;

FRINGE INCLINATION; HYPERBOLIC PHASE PROGRESSION; INTERFERENCE ANGLE; SPHERICAL BEAM INTERFERENCE LITHOGRAPHY;

LITHOGRAPHY;

EID: 0035519152     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1421558     Document Type: Article

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