Fabrication of high-numerical-aperture phase zone plates with a single lithography exposure and no etching

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 21, Issue 6, 2003, Pages 2956-2960

  Gil, Dario ^a   Menon, Rajesh ^a   Smith, Henry I ^a  

^a USA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROMAGNETISM; GALLIUM NITRIDE; HOLOGRAPHY; OPTICAL RESOLVING POWER; PHOTOLITHOGRAPHY; RADIATION; REACTIVE ION ETCHING; SOLID STATE LASERS; X RAY MICROSCOPES;

SOFT X-RAY RADIATION; ZONE PLATE ARRAYS;

DIFFRACTIVE OPTICS;

EID: 0942267536     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1619957     Document Type: Conference Paper

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