Optical waveguides with apodized sidewall gratings via spatial-phase-locked electron-beam lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 20, Issue 6, 2002, Pages 2753-2757

  Hastings, J T ^a   Lim, Michael H ^a,b   Goodberlet, J G ^a   Smith, Henry I ^a  

^a Department of Electrical Engineering and Computer Science   (United States)

^b Clarendon Photonics   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CROSSTALK; DENSE WAVELENGTH DIVISION MULTIPLEXING; EIGENVALUES AND EIGENFUNCTIONS; ELECTRON BEAM LITHOGRAPHY; EPITAXIAL GROWTH; FIBER BRAGG GRATINGS; FINITE DIFFERENCE METHOD; REFRACTIVE INDEX; SEMICONDUCTING SILICON; SIGNAL FILTERING AND PREDICTION; SILICA; SILICON ON INSULATOR TECHNOLOGY;

APODIZATION; APODIZED SIDEWALL GRATINGS; SILICON ON INSULATOR RIB WAVEGUIDE; SPATIAL PHASE LOCKED ELECTRON BEAM LITHOGRAPHY;

OPTICAL WAVEGUIDES;

EID: 0036883159     PISSN: 0734211X     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1521744     Document Type: Article

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